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Mou, S, Stantchev, RI, Saxena, S, Ou, H, Rane, S, Pain, SL, Murphy, JD, Hendry, E, Lloyd-Hughes, J & Pickwell-MacPherson, E 2026, 'All-fibre-coupled terahertz single-pixel imaging for biomedical applications', Nature Communications, vol. 17, 1571. https://doi.org/10.1038/s41467-026-68290-x
Grant, NE, Yadav, A, Pain, SL, Wilkins, L, Khorani, E & Black, L 2026, 'A non-destructive method to infer the bulk lifetime in high-quality silicon wafers', Solar Energy Materials and Solar Cells, vol. 297, 114125. https://doi.org/10.1016/j.solmat.2025.114125
Pain, SL, Wilkins, L, Sharpe, MK, McAleese, CD, Hall, KJ, Murphy, JD & Grant, NE 2026, 'Hydrogen in aluminium oxide films grown for silicon surface passivation by plasma-enhanced atomic layer deposition', Applied Surface Science, pp. 166660. https://doi.org/10.1016/j.apsusc.2026.166660
Tian, X, Renz, AB, Yildirim, MA, Melnyk, K, Iosifidis, N, Jefferies, R, Pain, S, Walker, D, Gott, JA, Agbo, NS, Taylor, P, Boccarossa, M, Maresca, L, Irace, A, Shah, VA, Antoniou, M, Mawby, PA & Gammon, PM 2026, 'Investigation of temperature-dependent oxide capacitance in paraelectric monoclinic doped HfO2/SiO2 gate stacks implemented on 4H-SiC', Applied Physics Letters, vol. 128, no. 14, 142904. https://doi.org/10.1063/5.0315887
Yadav, A, Healy, BFM, Pain, SL, Khorani, E, Wratten, A, Murphy, JD & Grant, NE 2026, 'Localized Direct Metal-Silicon Contacts through Controlled Pinhole Formation in Si/Al2O3/HfO2 Stacks', ACS Applied Electronic Materials, vol. 8, no. 11, pp. 4564-4571. https://doi.org/10.1021/acsaelm.6c00270
Willis, BL, Rigby, OM, Pain, SL, Grant, NE, Murphy, JD, Bonilla, RS & Beattie, NS 2026, 'Maximising environmental savings from silicon photovoltaics manufacturing to 2035', Nature Communications, vol. 17, 2311. https://doi.org/10.1038/s41467-026-69165-x
Khorani, E, Pain, SL, Yadav, A, Hall, KJ, Niewelt, T, Grant, NE & Murphy, JD 2026, 'Metallisation-associated degradation of silicon coated with thin dielectric layers', Semiconductor Science and Technology, vol. 41, no. 5, 055031. https://doi.org/10.1088/1361-6641/ae66aa
Healy, BFM, Pain, SL, Grant, NE & Murphy, JD 2026, 'Stable photoluminescence enhancement in monolayer molybdenum disulfide by superacid treatment', Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 44, no. 3, 032201. https://doi.org/10.1116/6.0005357
Healy, BFM, Hall, KJ, Pain, SL, Grant, NE & Murphy, JD 2026, 'Superacid treatment of dielectric-encapsulated monolayer molybdenum disulfide for enhanced photoluminescence', Journal of Materials Chemistry C. https://doi.org/10.1039/d6tc02199a
Willis, BL, Rigby, OM, Pain, SL, Grant, NE, Murphy, JD, Bonilla, RS & Beattie, NS 2026, 'Sustainability outlook for leading silicon photovoltaic technologies from 2023–2034 in Europe', EPJ Photovoltaics, vol. 17, 16. https://doi.org/10.1051/epjpv/2026009
Yadav, A, Pain, SL, Grant, NE, Zhu, Y, Hameiri, Z, Thome, FT, Altermatt, PP, Lord, JS, Yokoyama, K & Murphy, JD 2026, 'Temperature-Dependent Carrier Lifetime in Silicon Heterojunction Solar Cells Measured Using Photoexcited Muon Spin Spectroscopy', IEEE Journal of Photovoltaics. https://doi.org/10.1109/JPHOTOV.2026.3724232
Pain, SL, Yadav, A, Walker, D, Grant, NE & Murphy, JD 2025, 'Atomic Layer Deposition of Hafnium Oxide Passivating Layers on Silicon: Impact of Precursor Selection', Physica Status Solidi - Rapid Research Letters, vol. 19, no. 1, 2400202. https://doi.org/10.1002/pssr.202400202
Healy, BFM, Pain, SL, Grant, NE & Murphy, J 2025, 'Direct thermal atomic layer deposition of high-κ dielectrics on monolayer MoS2: nucleation and growth', Nanoscale, vol. 17, no. 25, pp. 15436-15447. https://doi.org/10.1039/d5nr01144b
Romain, X, Wilshaw, PR, Stantchev, RI, Miao, T, Mou, S, Niewelt, T, Mcnab, S, Pain, SL, Grant, NE, Bonilla, RS, Pickwell-Macpherson, E & Murphy, JD 2025, 'Electrically Tunable Si-Based THz Photomodulator Using Dielectric/Polymer Surface Gating', IEEE Transactions on Terahertz Science and Technology , vol. 15, no. 1, pp. 76-83. https://doi.org/10.1109/TTHZ.2024.3477983
Yadav, A, Pain, SL, Wilkins, L, Grant, NE, Lord, JS, Yokoyama, K & Murphy, JD 2025, 'Extracting surface and bulk recombination parameters for passivated silicon using photoexcited muon spin spectroscopy', Journal of Applied Physics, vol. 138, no. 13, 135701. https://doi.org/10.1063/5.0288808
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